Preparation and study of TiN nanostructured thin films by DC reactive magnetron sputtering with different mixing ratios of Ar:N2

Authors

  • رهف ضعون Tishreen University
  • Adnan Mini Tishreen University
  • Mohammad Karman Aleppo University

Abstract

Titanium nitride nanostructured thin films TiN were deposited at three different nitrogen ratio    (10, 25, 50) % on unheated glass substrates using direct current DC reactive magnetron sputtering. These films were obtained with thicknesses (90,171,264) nm respectively. The structural, morphological, optical and electrical properties of these thin films were studied. X-ray diffraction (XRD) patterns showed an amorphous phase. Atomic Force Microscopy (AFM) measurements showed that the deposited thin films have a nanostructure, according to heights of their grains. An increase in  roughness of the films was also observed with the increase in the nitrogen content. Spectroscopic analysis shows that the transmittance of films decrease with the increase of both nitrogen content and thickness of films. The values of the direct energy gap ranged between (3.57-3.33) eV. Photoluminescence emission of maximum intensity was obtained for the film deposited at 25% N2. Impedance measurements showed that films resistance did not change with the change of nitrogen content. 

Downloads

Published

2022-09-15

How to Cite

1.
ضعون ر, عدنان ميني, محمد بشير كرمان. Preparation and study of TiN nanostructured thin films by DC reactive magnetron sputtering with different mixing ratios of Ar:N2. TUJ-BA [Internet]. 2022Sep.15 [cited 2024May21];44(4):81-95. Available from: https://journal.tishreen.edu.sy/index.php/bassnc/article/view/11947

Issue

Vol. 44 No. 4 (2022): Tishreen University Journal of Research and Scientific Studies - Basic Sciences Series

Section

Master student researches

License

Creative Commons License

This work is licensed under a Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International License.

The authors retain the copyright and grant the right to publish in the magazine for the first time with the transfer of the commercial right to the Tishreen University Journal -Basic Sciences Series  

 Under a CC BY- NC-SA 04 license that allows others to share the work with of the work's authorship and initial publication in this journal. Authors can use a copy of their articles in their scientific activity, and on their scientific websites, provided that the place of publication is indicted in Tishreen University Journal -Basic Sciences Series .  The Readers have the right to send, print and subscribe to the initial version of the article, and the title of Tishreen University Journal -Basic Sciences Series   Publisher

 

journal uses a CC BY-NC-SA license which mean

You are free to:

  • Adapt — remix, transform, and build upon the material
  •  
  • The licensor cannot revoke these freedoms as long as you follow the license terms.

 

  • Attribution — You must give appropriate credit, provide a link to the license, and indicate if changes were made. You may do so in any reasonable manner, but not in any way that suggests the licensor endorses you or your use.
  • NonCommercial — You may not use the material for commercial purposes.
  • ShareAlike — If you remix, transform, or build upon the material, you must distribute your contributions under the same license as the original.
  • No additional restrictions — You may not apply legal terms or technological measures that legally restrict others from doing anything the license permits.