مطيافية إلكترون أوجيه لأفلام من أكسيد الزنك ZnO
Abstract
أجريت دراسة التركيب الكيميائي السطحي بواسطة مطيافية إلكترون أوجيه(AES) لطبقات من أكسيد الزنك المنماة بطريقة الترسيب الذري الطبقي. وقد تم تحديد العناصر المتوافرة على سطوح المواد، وتعيين التركيز الذري للعناصر على السطوح. لوحظت كمية صغيرة فقط من الكربون أو من مركبات الكربون، تم إزالتها بسهولة من خلال قذفها بايونات الأرغون. كما تبين أيضا أن قذف سطح العينة بايونات الأرغون لمدة طويلة يستنفذ الأكسجين منه جزئيا.
A study of surface chemical composition has been performed by using Auger Electron Spectroscopy (AES) for ZnO layers grown by Atomic Layer Deposition (ALD) procedure.Elements on surface of materials were identified,and, an atomic concentration of elements on surface was determinate. Onlysmall amount of carbon or carbon compounds detected, easily removed by argon ion sputtering. Also, long argon ion sputtering partly depleted surface of oxygen.
Downloads
Published
How to Cite
Issue
Section
License
This work is licensed under a Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International License.
The authors retain the copyright and grant the right to publish in the magazine for the first time with the transfer of the commercial right to the Tishreen University Journal -Basic Sciences Series
Under a CC BY- NC-SA 04 license that allows others to share the work with of the work's authorship and initial publication in this journal. Authors can use a copy of their articles in their scientific activity, and on their scientific websites, provided that the place of publication is indicted in Tishreen University Journal -Basic Sciences Series . The Readers have the right to send, print and subscribe to the initial version of the article, and the title of Tishreen University Journal -Basic Sciences Series Publisher
journal uses a CC BY-NC-SA license which mean
You are free to:
- Share — copy and redistribute the material in any medium or format
- Adapt — remix, transform, and build upon the material
- The licensor cannot revoke these freedoms as long as you follow the license terms.
- Attribution — You must give appropriate credit, provide a link to the license, and indicate if changes were made. You may do so in any reasonable manner, but not in any way that suggests the licensor endorses you or your use.
- NonCommercial — You may not use the material for commercial purposes.
- ShareAlike — If you remix, transform, or build upon the material, you must distribute your contributions under the same license as the original.
- No additional restrictions — You may not apply legal terms or technological measures that legally restrict others from doing anything the license permits.